{
    "protocol": "1. Prepare a chitosan solution for electrodeposition. 2. Set the temperature to a range of 0-5 °C to influence the deposition process. 3. Perform the first step of electrodeposition without salt to create the dense face of the Janus film. 4. Proceed with the second step of electrodeposition in the presence of salt to generate the porous face. 5. Control deposition conditions such as time and current density to adjust structural parameters (pore size, porosity, layer thicknesses) of the deposited hydrogel.Chitosan (7% w/v) was dissolved in 2M hydrochloric acid (pH range from 4.5–5.0), followed by the addition of 0.1 M H2O2. The temperatures of electrolytes were controlled at 27 and 5°C during the film’s electro-fabrication. Electro-fabrication was performed with a constant current density (0.83 to 20.01 mA cm^-2) and potential ranging from 3 to 8 V for designated times (from 100 to 1000 s). After electro-deposition, the chitosan-coated electrode was washed with ultra-pure water three times, and the deposited chitosan was peeled from the cathode to obtain a free-standing film."
}