{
    "protocol": "Thick PR molds with reversed hierarchical structures were prepared using a modified photolithography process. The unique structure of the PR molds is replicated on the PDMS surface. The structure is then re-replicated to the photocurable polymer layer for the purpose of reusing the mold.The PDMS monomer (base) and curing agent are mixed in a 10:1 ratio and placed in a desiccator to de-gas in a vacuum. The degassed PDMS solution is gently poured onto an under-baked PR mold and placed in a vacuum oven. The PDMS sample is degassed until trapped bubbles are removed from the interface with the PR mold. The thickness of the cured PDMS layer is controlled by adjusting the spin speed and number of coatings. The PDMS layer is cured at >80°C for 4h. The PR mold is removed using an acetone solution to replicate the super-hydrophobic PDMS film. For synthesis of UV-curable PUA, mix 85% 4-hydroxybutyl acrylate, 11% acrylic acid, 1% ethylene glycol dimethacrylate, and 3% 2'-dimethoxy-2-phenylacetone phenone. Pour this mixture on the replicated PDMS film and solidify with UV light for 20s at an optical power of 5mW."
}