{
    "protocol": "1. Prepare dipping solutions with the following concentrations: CHI and CMC at 1 mg/ml, positive charged SiO2 at 0.03% (w/w), and negative charged SiO2 at 0.03% (w/w). 2. For CHI, add 0.3% (v/v) acetic acid and dissolve the polymer. 3. Filter the solution with a 5 μm pore filter after stirring overnight. 4. Use deionized water (18.2 MΩ·cm at 25 °C) for all aqueous solutions. 5. Perform sequential stacking of polymer and nanoparticle layers using a StratoSequence 8 spin dipper. 6. Immerse the substrate in each dipping solution for 10 minutes followed by three rinsing steps (2, 1, and 1 min) in deionized water. 7. Create the polymeric reservoir (CHI/CMC)n by alternately dipping in CHI and CMC solutions with rinsing steps in between. 8. Prepare the polymer-silica nanocomposite by depositing two complementary interacting nanoparticles on the polymeric reservoir.To synthesize hydrophilic polymers with functional groups, follow these steps: First, fabricate a SU-8 pillar array using typical lithography with a negative photoresist (SU-8 50). Then, pour PDMS onto the master and cure it in an oven at 70°C for 3 hours. After that, pour a photocurable PFPE polymer precursor containing 4% (w/w) Darocur 1173 into the PDMS microwell and remove the excess using a razorblade. Prior to attachment and curing, infuse the polymer-silica nanocomposite with silicone oil to prevent PFPE film formation on the polymer-silica nanocomposite. Finally, irradiate with UV light at an intensity of 20 mW cm^-2 for 5 minutes to induce photocuring of the PFPE pillars, and wash off any residue with acetone."
}